Multiprep Polishing Machine Precision Quantitative Grinding Machine Multiprep Polishing System

• Diameter: 8 Inch
• Speed of Working Disc: 0-600rpm, Stepless Speed Regulation
• Direction of Working Disc: Cw/Ccw
• Power of Working Disc: 750W
• Factory Inspection of Working Disc: Flatness < 2um
• Speed of Sample Holder: 0-50rpm, Stepless Speed Regulation
• Model NO.: SemiPOL High Precision Quantitative Grinding Mach
• Direction of Sample Holder: Cw/Ccw
• Rotate: Y, Adjustable
• Swing: Y, Swing Range and Speed Adjustable
• Factory Inspection of Sample Holder: Perpendicularity to The Disk <2um; Parallelism <2u
• Maximum Removal Capacity: 20mm
• Power Supply: 220VAC
• Panel: 7-Inch Touch Screen
• Wxdxh: 700X430X580mm
• Weight: 57kg
• Transport Package: Standard Case or Customized
• Specification: 700x430x580mm
• Trademark: Trojan
• Origin: China
• Production Capacity: 5000pieces/Year

Product Description

Product Description

The MultiPrep™ System enables precise semiautomatic sample preparation of a wide range of materials for microscopic (optical, SEM, FIB, TEM, AFM, etc.) evaluation. 

Capabilities include parallel polishing, angle polishing, site-specific polishing or any combination thereof. It provides reproducible results by eliminating inconsistencies between users, regardless of their skill. 

Dual micrometers (pitch and roll) allow precise sample tilt adjustments relative to the abrasive plane. A rigid Z-indexing spindle maintains the predefined geometric orientation throughout the grinding/polishing process. Digital indicators enable quantifiable material removal, which can be monitored real-time, or preset for unattended operation. Variable speed rotation and oscillation maximize the use of the entire grinding/polishing disc and minimize artifacts. Adjustable load control expands its capability to handle a range of small (delicate) to large samples.

Features

Front digital indicator to display real-time material removal (sample advancement), 1 µm resolution

Dual axis, micrometer controlled angular positioning of the sample (pitch and roll): +10°/-2.5° range (0.02° increments)

Full or limited automatic sample rotation with 8 speeds

Variable sample load: 0-600 g (100 g increments)

Precision spindle that indexes the sample perpendicular to the platen, and can rotate simultaneously

Rear digital indicator to display vertical positioning (static) with zeroing function, 1 µm resolution

Cam-locking system that eliminates the need for tools and allows for precise repositioning of fixtures

Designed & manufactured by Allied in the USA
 

Product Parameters

Model                                                                      SemiPOL
Working disc	Diameter	8 inch
	Speed	0-600rpm,stepless speed regulation
	Direction	CW/CCW
	Power	750W
	Factory inspection	Flatness < 2um
Sample holder	Speed	0-50rpm,stepless speed regulation
	Direction	CW/CCW
	Rotate	Y, adjustable
	Swing	Y, Swing range and speed adjustable
	Factory inspection	Perpendicularity to the disk <2um; parallelism <2um
	Maximum removal capacity	20mm
Electricity	Power supply	220VAC
Panel		7-inch touch screen
Dimension	WxDxH	700x430x580mm
Weight		57kg

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